Member:Tsuda
京大推進研
（版間での差分）
(ページの作成: = 津田 博隆 / Hirotaka Tsuda = *学年：博士課程1年 *所属学会：応用物理学会 == Journal articles == *Hirotaka Tsuda, Masahiko Mori, Yoshinori Takao, Koji ...) |
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*Hirotaka Tsuda, Masahiko Mori, Yoshinori Takao, Koji Eriguchi, and Kouichi Ono: "Atomic-Scale Cellular Model and Profile Simulation of Si Etching: Analysis of Profile Anomalies and Microscopic Uniformity", Jpn. J. Appl. Phys. '''49''' (2010) 08JE01. http://jjap.ipap.jp/link?JJAP/49/08JE01/ | *Hirotaka Tsuda, Masahiko Mori, Yoshinori Takao, Koji Eriguchi, and Kouichi Ono: "Atomic-Scale Cellular Model and Profile Simulation of Si Etching: Analysis of Profile Anomalies and Microscopic Uniformity", Jpn. J. Appl. Phys. '''49''' (2010) 08JE01. http://jjap.ipap.jp/link?JJAP/49/08JE01/ | ||
| − | *Hirotaka Tsuda, Masahiko Mori, Yoshinori Takao, Koji Eriguchi and Kouichi Ono: "Atomic-scale cellular model and profile simulation of Si etching: Formation of surface roughness and residue", Thin Solid Films '''518''' (2010) 3475-3480. doi:10.1016/j.tsf.2009.11.043 | + | *Hirotaka Tsuda, Masahiko Mori, Yoshinori Takao, Koji Eriguchi and Kouichi Ono: "Atomic-scale cellular model and profile simulation of Si etching: Formation of surface roughness and residue", Thin Solid Films '''518''' (2010) 3475-3480. [[doi:10.1016/j.tsf.2009.11.043]] |
*Hirotaka Tsuda, Koji Eriguchi, Kouichi Ono, and Hiroaki Ohta: "Molecular-Dynamics-Based Profile Evolution Simulation for Sub-10-nm Si Processing Technology", Appl. Phys. Express '''2''' (2009) 116501. http://apex.ipap.jp/link?APEX/2/116501/ | *Hirotaka Tsuda, Koji Eriguchi, Kouichi Ono, and Hiroaki Ohta: "Molecular-Dynamics-Based Profile Evolution Simulation for Sub-10-nm Si Processing Technology", Appl. Phys. Express '''2''' (2009) 116501. http://apex.ipap.jp/link?APEX/2/116501/ | ||
2010年10月14日 (木) 15:08時点における版
津田 博隆 / Hirotaka Tsuda
- 学年：博士課程1年
- 所属学会：応用物理学会
Journal articles
- Hirotaka Tsuda, Masahiko Mori, Yoshinori Takao, Koji Eriguchi, and Kouichi Ono: "Atomic-Scale Cellular Model and Profile Simulation of Si Etching: Analysis of Profile Anomalies and Microscopic Uniformity", Jpn. J. Appl. Phys. 49 (2010) 08JE01. http://jjap.ipap.jp/link?JJAP/49/08JE01/
- Hirotaka Tsuda, Masahiko Mori, Yoshinori Takao, Koji Eriguchi and Kouichi Ono: "Atomic-scale cellular model and profile simulation of Si etching: Formation of surface roughness and residue", Thin Solid Films 518 (2010) 3475-3480. doi:10.1016/j.tsf.2009.11.043
- Hirotaka Tsuda, Koji Eriguchi, Kouichi Ono, and Hiroaki Ohta: "Molecular-Dynamics-Based Profile Evolution Simulation for Sub-10-nm Si Processing Technology", Appl. Phys. Express 2 (2009) 116501. http://apex.ipap.jp/link?APEX/2/116501/